10 Questions You Should to Know about tantalum sputtering targets

The life of a sputter target is typically quantified in terms of units of power and time, like kilowatt/hours. For a target being sputtered at 500 watts for a total duty cycle of 100 hours that’s 50 kilowatt/hours. Target life is also a function of the sputter yield of the material or how many target atoms are ejected for each gas ion (typically argon) that strikes the surface. For example when an argon ion with a mass of 39.948, hits a light material, like carbon, with an atomic mass of 12.01, about 3 carbon atoms are ejected. For materials like platinum with an atomic mass of 195.09, nearly 5 argon ions have to strike the target to get one platinum atom out (Ref 1).

Other factors that affect sputter yield include the bias voltage used to accelerate the argon ion to the target surface and the incident angle of the collision. In addition, there are big differences in sputter yield for metals verses oxides. Typically oxides will last many more kilowatt/hours than metals like aluminum.

One of our resident thin film deposition experts, Rob Belan, recommends that a target be replaced when the trench depth of the race track is ¾ of the total target thickness. For a ¼″ thick target there will be 0.062″ of material remaining at the bottom of the trench. He adds that if you are particularly careful you may be able to sputter the trench to a thickness of 0.031″, but beyond that you are risking a complete burn through.

A handy online calculator for sputter yield can be found at TU Wein’s Institute fur Angewandte Physik. I’m not sure how accurate it is, but it does list out several single element metals and their yields:

https://www.iap.tuwien.ac.at/www/surface/sputteryield

For a list of sputter yields using other ions, such as xenon and neon, there is an expansive data base on the web site of the National Physical Laboratory. Their data base also includes sputter yields at various powers (Ref 2).

So to determine when it is time to change out a sputter target you will need to have a depth gauge, either digital or dial. Check the depth of the trench in the race track after every deposition until you get a feel for the number of kilowatt/hours it takes to thin the target out to 25% of its original thickness (Ref 3). For those looking for an in-situ, real time method for measuring target thickness during sputtering, check out the publication from Alex Leybovich of TOSOH SMD who used ultrasonic time of flight measurements to monitor the health of sputter targets and target bonding during thin film depositions (Ref 4).

References:

1. Argonne National Laboratory, “Noble Gas Sputtering Calculations using TRIM,” https://www.osti.gov/biblio/
2. National Physical Laboratory of the UK, http://www.npl.co.uk/science-technology/surface-and-nanoanalysis/services/sputter-yield-values
3. MSC Direct, https://www.mscdirect.com/browse/Measuring-Inspecting/Dimensional-Measuring-Tools/Depth-Gages/?navid=&cid=ppc-bing-New%20-%20Measuring%20%26%20Inspecting%20-%20Product%20-%20PPC%20-%20Exact_I4PUCfCI_depth%20gauge_be__c_&mkwid=I4PUCfCI|dc&pcrid=&utm_source=bing&utm_medium=cpc&utm_campaign=New%20-%20Measuring%20%26%20Inspecting%20-%20Product%20-%20PPC%20-%20Exact&utm_term=depth%20gauge&utm_content=Depth%20Gages
4. In-situ real time sputtering source health monitoring using ultrasonics, Alex Leybovich, TOSOH SMD, Grove City, OH, , https://www.sciencedirect.com/science/article/pii/S?via%3Dihub

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Category: Deposition Equipment

Sub-Category: Sputtering Targets

Related Topics: Sputtering, Process

Introduction

Tantalum Carbide (TaC) sputtering targets are essential in thin film deposition. These materials are known for their high hardness, heat resistance, and durability. TaC is used to create coatings that perform well in extreme environments. These qualities make it a popular choice in modern industries.

This article will explore the top five applications of TaC sputtering targets. From thermal barrier coatings to corrosion-resistant films, TaC helps improve product performance and reliability.

1. High-Temperature Coatings

Tantalum Carbide (TaC) is widely used for thermal barrier coatings. These coatings protect materials exposed to high temperatures, such as in gas turbines and spacecraft. TaC has an extremely high melting point of °C, making it ideal for these applications.

In aerospace, TaC coatings shield parts from heat stress and oxidation. This helps improve the efficiency and lifespan of engines. In the energy industry, TaC coatings are applied to turbines to reduce thermal fatigue. This extends the operational life of equipment and reduces maintenance costs.

By providing superior heat resistance, TaC sputtering targets are essential for industries that operate under extreme conditions.

2. Hard Coatings for Industrial Tools

TaC sputtering targets are critical for creating hard coatings on industrial tools. These coatings improve the durability and wear resistance of tools such as drills, cutting blades, and molds. TaC’s high hardness ensures that tools can withstand intense pressure and friction during use.

In metalworking and manufacturing, TaC-coated tools last longer and perform better. These coatings reduce wear, extending the lifespan of expensive equipment. For example, cutting tools with TaC coatings maintain sharp edges even when working with tough materials like steel or titanium.

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By enhancing tool performance, TaC sputtering targets help industries save costs and improve production efficiency.

3. Optical Coatings

Tantalum Carbide (TaC) is a valuable material for creating optical coatings. These coatings are used in lenses, mirrors, and infrared windows. TaC has a high refractive index, which helps improve light transmission and reduce reflection. This makes it ideal for applications where clarity and precision are essential.

In the optics industry, TaC coatings are applied to equipment used in scientific research, military systems, and high-tech imaging devices. For example, infrared cameras often rely on TaC-coated windows to improve performance under harsh conditions. These coatings are also durable, maintaining optical quality even after long-term exposure to heat and wear.

By providing reliable and efficient optical coatings, TaC sputtering targets play a crucial role in advancing optical technology.

4. Semiconductor Thin Films

Tantalum Carbide (TaC) sputtering targets are widely used in the semiconductor industry. TaC coatings are applied to create thin films that protect electronic components. These films provide excellent conductivity and thermal stability, which are essential for the performance of semiconductors.

In chip manufacturing, TaC thin films are used as diffusion barriers. They prevent the migration of materials like copper, ensuring the reliability of microchips. TaC also supports high-precision deposition, which is crucial for creating uniform and defect-free layers on delicate electronic components.

With its durability and precision, TaC plays a key role in improving semiconductor devices used in computers, mobile phones, and other advanced electronics.

5. Corrosion-Resistant Coatings

Tantalum Carbide (TaC) sputtering targets are also used to create corrosion-resistant coatings. These coatings protect equipment and structures from chemical damage in harsh environments. TaC’s chemical inertness makes it ideal for preventing corrosion caused by acids, alkalis, and other reactive substances.

Industries such as petrochemicals, pharmaceuticals, and energy rely on TaC coatings for their critical systems. For example, reactors, storage tanks, and pipelines often use TaC-coated surfaces to withstand corrosive materials. These coatings not only reduce maintenance costs but also extend the lifespan of expensive equipment.

By providing superior corrosion resistance, TaC sputtering targets help ensure the durability and reliability of industrial systems.

Conclusion

Tantalum Carbide (TaC) sputtering targets are critical for creating advanced coatings across various industries. From thermal barriers and hard coatings to optical films, semiconductor layers, and corrosion-resistant surfaces, TaC plays an essential role. Its unique properties, including extreme hardness, high melting point, and chemical inertness, make it indispensable in high-performance applications.

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